Parallel direct laser writing in three dimensions with spatially dependent aberration correction

Jesacher A, Booth MJ. Opt Express. 2010 Sep 27;18(20):21090-9.

We propose a hologram design process which aims at reducingaberrations in parallel three-dimensional direct laser writing applications.One principle of the approach is to minimise the diffractive power ofholograms while retaining the degree of parallelisation. This reducesfocal distortion caused by chromatic aberration. We address associatedproblems such as the zero diffraction order and aberrations induced by apotential refractive index mismatch between the immersion medium of themicroscope objective and the fabrication substrate. Results from fabricationin diamond, fused silica and lithium niobate are presented.

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